Product description
Focus ring for Lam Research ESC/etch chamber use, identified as an 8 inch ESC focus ring and 4528 etcher focus ring.
Specifications and identifiers
identified attributes
| Function | ESC focus ring |
|---|
| Size/context | 8 inch |
|---|
| Process/chamber context | 4528 oxide etch / ESC context |
|---|
Equipment context
- Lam 4528 etcher
- Lam 4528 oxide etch
Applications
Process chamber kitsPVD/CVD/etch chamber maintenanceWafer-edge or pedestal-area hardwarePlasma etch chamber focus-ring serviceWafer edge plasma confinement around an electrostatic chuck
How it works
A chamber or wafer-area mechanical component used near the wafer, pedestal, or plasma/process region.
Geometry, material, surface condition, and revision can affect process uniformity, particle generation, and chamber fit.
Technical guide
- ESC
- Electrostatic chuck; a wafer-holding chuck that uses electrostatic force.
What to verify before purchase
- Confirm exact material, revision, and chamber configuration before installation.
- Inspect ring condition, erosion, chips, and clean/contamination state.
Confirm with the seller
- Exact ceramic material is not confirmed.
- Direct chamber compatibility beyond 4528/ESC context is not confirmed.
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.