Product description
Lam Research quartz confinement ring.
Specifications and identifiers
identification
| Item | Confinement ring Process-chamber ring used to define or confine plasma/gas flow region. |
|---|
| Material | Quartz Material stated in the item description. |
|---|
Applications
CVD and HDP-CVD chambersetch process modulesCMP head and wafer support assembliesplasma chamber confinement ringquartz process ring replacement
How it works
A chamber consumable or process-facing component sits in or near the process environment and influences gas flow, plasma boundary conditions, shielding, or wafer support.
Material, coating, dimensions, and surface condition can affect particles, deposition/etch uniformity, and chamber matching.
Technical guide
- CVD
- Chemical vapor deposition.
- HDP-CVD
- High-density plasma chemical vapor deposition.
- TEOS
- Tetraethyl orthosilicate, a common silicon-oxide precursor.
What to verify before purchase
- Verify dimensions, hole/notch pattern, and compatible Lam chamber.
- Inspect quartz for chips, cracks, discoloration, or contamination.
Confirm with the seller
- Exact Lam platform/chamber compatibility.
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.