Product description
Edge ring, 8 in, ESC/NCH top, quartz
Specifications and identifiers
identification
| Item type | Top edge ring |
|---|
| Material | Quartz |
|---|
| Wafer size context | 8 in |
|---|
| Chuck context | ESC Electrostatic chuck context indicated by descriptions. |
|---|
| Position | Top |
|---|
Equipment context
- Lam Research 8 in ESC process module
Applications
plasma etch chambersESC assemblieswafer-edge process controlESC edge controlplasma chamber edge-ring replacement8 in wafer chamber consumable
How it works
A process-chamber ring component used around the wafer or chuck area for confinement, shielding, spacing, or process-edge control.
Material, diameter, wafer size, revision, and chamber position must match the process module to avoid particle or plasma issues.
What to verify before purchase
- Verify revision and chamber/process match.
- Confirm quartz condition and cleaned/used status requirements.
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.