Product description
ASSY ELECTRODE, ESC 8 in; lower electrode/base assembly associated with Lam Research ESC hardware.
Specifications and identifiers
configuration
| Wafer/chuck size | 8 in Stated as an 8 inch ESC/electrode assembly. |
|---|
| Associated assembly | Lower electrode base / ESC assembly Describes the electrode/base hardware used in the chuck stack. |
|---|
Equipment context
- Lam Research process chamber ESC assembly
Applications
etch or deposition chamber wafer supportRF-biased wafer pedestal systemselectrostatic chuck service or rebuild workESC lower electrode servicewafer support and RF bias interfaceLam process chamber chuck rebuild
How it works
A wafer-support electrode or chuck-related assembly used in plasma process modules.
ESC and electrode assemblies directly affect wafer clamping, RF coupling, thermal transfer, and process repeatability.
What to verify before purchase
- Verify revision and notch/flat configuration.
- Inspect ceramic/electrode surface condition and HV feedthroughs.
Product reference only. Confirm fitment, revision, included components, and specifications before purchase.